Hello,
I'm working with the TSMC 0.18um PDK for our Labs. I faced two problems which are new in this PDK for me against the X-Fab or AMS. I will be appreciated if anyone shares his/her experience towards them.
1. I'm using the Layout L for drawing my layout of the schematic. Why when I import the layout of a transistor and remove the source or drain contacts of it, the diffusion region of the contacts will remain? For example, when two transistors are in the cascode structure, and you don't need to the common node between them, you prefer to remove their contacts that in the layout be able to place two transistors as close as possible (Poly distance). But when the diffusion region remains, you cannot do that. My question is here, is there a different setup for removing the diffusion region of the contact in TSMC PDK? However, I checked it with Layout XL, and it did it automatically (Removing diffusion) for the same structure. How can I do it manually?
2. Regarding the Pin definition in the layout, I cannot define a pin on the poly layer with Poly Pin. I mean that when we want to set a pin on the poly with Poly Pin Layer, it'll not recognize with LVC check as a port. I should use a Poly-MET1 Via and then create a pin with MET1 pin. My question is here that whether TSMC PDK only allows the user to use of Metal for pin definition or not. I haven't faced any problem with Pins have been defined by Metal.
Best,